Backside wafer thinning equipment
Fully automatic 8-inch thinning machine
Equipment Characteristics
Fully automated lapping machine with two spindles and three tables for 4/5/6/8” wafer processing.
Si, SiC and other grinding materials can be satisfied.
In order to realize high-quality grinding process, the main machine is equipped with high power output, high rigidity, low vibration air spindle; the table spindle is also equipped with high rigidity, low vibration, low thermal expansion, high rotary accuracy air bearings.
Equipped with contact thickness measurement module to realize closed-loop system control.
Equipped with self-developed 250mm grinding wheel, effectively removing the stress of wafer grinding, reducing surface damage and ensuring the strength of the chip.
Equipment Specifications
Maximum Wafer Size (mm)
200
Z-axis resolution (μm)
0.1
Grinding wheel spindle power (kw)
7.5
Maximum wheel speed (rpm)
4000
Maximum table speed (rpm)
300
Minimum machining thickness (μm)
70
Total Thickness Deviation TTV (μm)
≤2.5
Sheet-to-sheet thickness deviation WTW(μm)
±2.5